Mattson Technology, Inc. designs, manufactures, markets, and supports semiconductor wafer processing equipment for use in fabricating integrated circuits (ICs) worldwide. Its dry strip products include the SUPREMA strip system, which is used for production and process development at 20 nanometer technology nodes and beyond by semiconductor companies. The company’s etch products comprise the paradigmE and Alpine systems that feature a proprietary Faraday-Shielded ICP plasma source combined with etch bias control for production and process development at advanced memory and foundry/logic wafer fabs. Its conventional rapid thermal processing products include the Helios XP for use in IC production based on its dual side wafer heating and differential thermal energy control; and Millisecond Anneal products comprise Millios system for gate anneal and activation process requirements. The company sells its products directly, as well as through distribution agreements to memory, and foundry/logic device manufacturers. Mattson Technology, Inc. was founded in 1988 and is headquartered in Fremont, California.