Nanometrics Incorporated provides high-performance process control metrology and inspection systems used primarily in the fabrication of integrated circuits, high-brightness LEDs, discrete components, and data storage devices in the United States, South Korea, China, Taiwan, and internationally. It offers automated metrology systems that provide optical critical dimension, thin film metrology, and wafer stress for transistor and interconnect metrology applications; and the Lynx platform enables cluster metrology factory automation for wafer metrology applications, such as optical critical dimension metrology and thin film process control. The company's automated and integrated systems are also used in various process control applications, including dimension and film thickness measurement, device topography, and defect inspection, as well as used in the analysis of various other film properties, such as optical, electrical, and material characteristics. Its process control solutions are deployed in the fabrication process from front-end-of-line substrate manufacturing to high-volume production of semiconductors and other devices, as well as to wafer-scale packaging applications. The company sells its metrology and inspection systems directly to end customers and through original equipment manufacturer channels to semiconductor manufacturers and equipment suppliers, and producers of high-brightness-LEDs, data storage devices, silicon wafers, solar photo-voltaics, and photomasks. Nanometrics Incorporated was founded in 1975 and is headquartered in Milpitas, California.