Nanometrics Incorporated provides high-performance process control metrology systems used primarily in the fabrication of integrated circuits, high-brightness LEDs, data storage devices, and solar photovoltaics. It offers automated metrology systems that provide optical critical dimension, thin film metrology, and wafer stress for transistor and interconnect metrology applications; the Lynx cluster metrology platform for use in wafer metrology applications, including optical critical dimension, overlay, and thin film process control; and integrated metrology systems, which provide near real-time measurements. The company's automated and integrated systems are also used in various process control applications, including dimension and film thickness measurement, device topography, and defect inspection, as well as used in the analysis of other film properties, such as optical, electrical, and material characteristics. Its process control solutions are deployed in the fabrication process from front-end-of-line substrate manufacturing to high-volume production of semiconductors and other devices, and to wafer-scale packaging applications. The company sells its metrology and inspection systems directly and through original equipment manufacturer channels to semiconductor manufacturers and equipment suppliers, and producers of high-brightness-LEDs, solar photovoltaics, data storage devices, silicon wafers, and photomasks worldwide. Nanometrics Incorporated was founded in 1975 and is headquartered in Milpitas, California.